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Volumn 7, Issue 1, 2003, Pages 93-105

Calculation of silicon particles dynamics, heat and mass transfers in thermal plasmas. Effect of particles vaporization

Author keywords

Calculation; Heat and mass transfer; Particle; Vaporization

Indexed keywords

ENERGY DISSIPATION; HEAT TRANSFER; INDUCTIVELY COUPLED PLASMA; MASS TRANSFER; PLASMA TORCHES; SILICON; VAPORIZATION;

EID: 0142007868     PISSN: 10933611     EISSN: None     Source Type: Journal    
DOI: 10.1615/HighTempMatProc.v7.i1.140     Document Type: Conference Paper
Times cited : (7)

References (14)
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    • (1977) Physics and Technology of Low Temperature Plasmas
    • Dresvin, S.1
  • 2
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    • Pfender E., Lee Y. C., "Particle Dynamics and Particle Heat and Mass Transfer in Thermal Plasmas. Part I. The Motion of a Single Particle without Thermal Effects", Plasma Chem. Plasma Process. 5 (3), 211 (1985).
    • (1985) Plasma Chem. Plasma Process. , vol.5 , Issue.3 , pp. 211
    • Pfender, E.1    Lee, Y.C.2
  • 3
    • 0042692805 scopus 로고
    • Plasma Modeling and Computer Simulation
    • P. W. J. Boumans, Ed. (Wiley, New York)
    • M. Boulos and R. Barnes, "Plasma Modeling and Computer Simulation" in Inductively Coupled Plasma Emission Spectroscopy, P. W. J. Boumans, Ed. (Wiley, New York, 1987.) - Part II. - pp. 289-352.
    • (1987) Inductively Coupled Plasma Emission Spectroscopy , Issue.PART II , pp. 289-352
    • Boulos, M.1    Barnes, R.2
  • 6
    • 0017503377 scopus 로고
    • Particle Heating in a Radio-Frequency Plasma Torch
    • T. Yoshida and K. Akashi, "Particle Heating in a Radio-Frequency Plasma Torch", J. Appl. Phys. 48 (6), 2252 (1977).
    • (1977) J. Appl. Phys. , vol.48 , Issue.6 , pp. 2252
    • Yoshida, T.1    Akashi, K.2
  • 8
    • 0022203804 scopus 로고
    • Particle Dynamics and Particle Heat and Mass Transfer in Thermal Plasmas. Part II. Particle Heat and Mass Transfer in Thermal Plasmas
    • Lee Y. C., Chyou Y. P., Pfender E., "Particle Dynamics and Particle Heat and Mass Transfer in Thermal Plasmas. Part II. Particle Heat and Mass Transfer in Thermal Plasmas", Plasma Chem. Plasma Process. 5 (4), 391 (1985).
    • (1985) Plasma Chem. Plasma Process. , vol.5 , Issue.4 , pp. 391
    • Lee, Y.C.1    Chyou, Y.P.2    Pfender, E.3
  • 10
    • 0141912554 scopus 로고    scopus 로고
    • NIST database, http:// www.webbook.nist.gov
  • 12
    • 0141947013 scopus 로고    scopus 로고
    • Calculation of Temperature and Flow in RF Plasmatorch - Influence of Cold Channel Produced by Axial Gas Injection
    • P. Faushais, J. Amouroux, Eds. - Begell House, N.Y., Walling Ford (U.K.)
    • Nguyen Kuok Shi, S. Dresvin, J. Amouroux, and D. Morvan, "Calculation of Temperature and Flow in RF Plasmatorch - Influence of Cold Channel Produced by Axial Gas Injection" in Progress in Plasma Processing of Materials 1999. P. Faushais, J. Amouroux, Eds. - Begell House, N.Y., Walling Ford (U.K.), 1999. -pp. 169-175.
    • (1999) Progress in Plasma Processing of Materials 1999 , pp. 169-175
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  • 14
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    • On-line Diagnostics of Silicon Particles Diameter by PDA Method in a RF thermal Plasma Torch during Evaporation Phenomena
    • A. Bouchoule et al., Eds., University of Orléans
    • E. Francke, M. Benmansour, D. Morvan, J. Amouroux, "On-line Diagnostics of Silicon Particles Diameter by PDA Method in a RF thermal Plasma Torch during Evaporation Phenomena", Proc. ISPC-15 (2001), A. Bouchoule et al., Eds., University of Orléans, p. 1063.
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.