Sheath Expansion Dynamics during Plasma Implantation of Insulating Materials

IEEE International Conference on Plasma Science

Volumn , Issue , 2003, Pages 193-

  Tian, X B ^a,b   Fu, R K Y ^b   Yang, S Q ^a   Chu, P K ^b  

^a HARBIN INSTITUTE OF TECHNOLOGY   (China)

^b CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; INDUSTRIAL APPLICATIONS; PLASMA SHEATHS; TARGETS;

PLASMA IMPLANTATION;

PLASMA APPLICATIONS;

EID: 0141997702     PISSN: 07309244     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (0)