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Volumn 370, Issue , 2001, Pages 169-172
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Fabrication and photodegradation behavior of photosensitive polyimide LB film
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Author keywords
Photodegradation behavior; Polyamic acid; Polyimide LB film; Positive resist; Resolution
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Indexed keywords
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EID: 0141972565
PISSN: 1058725X
EISSN: None
Source Type: Journal
DOI: 10.1080/10587250108030063 Document Type: Article |
Times cited : (4)
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References (1)
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