Controlled self-assembly of mercapto and silane terminated molecules at Cu surfaces

Journal of Electroanalytical Chemistry

Volumn 556, Issue , 2003, Pages 147-158

  Tremont, Rolando J ^a   Blasini, Daniel R ^a   Cabrera, Carlos R ^a  

^a UNIVERSITY OF PUERTO RICO   (Puerto Rico)

Author keywords

1 Propanethiol; 3 Mercaptopropyltrimethoxysilane; Copper; Pb electroreduction; Propyltrimethoxysilane; Self assembled monolayer

Indexed keywords

DIFFUSION; ELECTRODEPOSITION; SELF ASSEMBLY; SILANES; SURFACE TREATMENT; X RAY PHOTOELECTRON SPECTROSCOPY;

DESORPTION POTENTIALS;

COPPER;

EID: 0141921525     PISSN: 15726657     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0728(03)00340-1     Document Type: Article

References (38)

1. Finklea H.O. Bard A.J., Rubinstein I. Electroanalytical Chemistry. 19:1996;Marcel Dekker, New York. Chapter 2.
2. Ulman A. Chem. Rev. 96:1996;1533.
3. Kolb D.M. Gerischer H., Tobias C.W. Advances in Electrochemistry and Electrochemical Engineering. 11:1978;Wiley, New York.
4. Bard A.J., Abruña H.D., Chidsey C.E., Faulkner L.R., Feldberg S.W., Itaya K., Majda D., Melroy O., Murray R.W., Porter M.D., Soriaga M.P., White H.S. J. Phys. Chem. 97:1993;7147.
5. Dubois L.H., Nuzzo R.G. Annu. Rev. Chem. Phys. 43:1992;437.
6. Whiteside G.M., Laibinis P.E. Langmuir. 6:1990;87.
7. Finklea H.O., Avery S., Lynch M., Furtsch T. Langmuir. 3:1987;409.
8. Porter M.D., Bright T.B., Allara D., Chidsey C.E.D. J. Am. Chem. Soc. 109:1987;3559.
9. Sabatani E., Rubinstein I., Maoz R., Sagiv J. J. Electroanal. Chem. 219:1987;365.
10. Sabatani E., Rubinstein I. J. Phys. Chem. 91:1987;6663.
11. Finklea H.O., Snider D.A., Fedyk J. Langmuir. 6:1990;371.
12. Finklea H.O., Snider D.A., Fedyk J., Sabatani E., Gafni Y., Rubinstein I. Langmuir. 9:1993;3660.
13. Sun L., Crooks R.M. J. Electrochem. Soc. 138:1991;L23.
14. Gilbert S.E., Cavalleri O., Kern K. J. Phys. Chem. 100:1996;12123.
15. Cavalleri O., Gilbert S.E., Kern K. Chem. Phys. Lett. 269:1997;479.
16. Sondag-Huethorst J.A.M., Fokkink L.G.J. Langmuir. 11:1995;4823.
17. Eliadis E.D., Nuzzo R.G., Gewirth A.A., Alkire R.C. J. Electrochem. Soc. 144:1997;96.
18. Oyamatsu D., Kuwabata S., Yoneyama H. J. Electroanal. Chem. 473:1999;59.
19. Tremont R.J., De Jesús-Cardona H., García-Orozco J., Castro R.J., Cabrera C.R. J. Appl. Electrochem. 30:2000;737.
20. Tremont R.J., Cabrera C.R. J. Appl. Electrochem. 32:2002;1.
21. Musiani M., Mengoli G., Fleischmann M., Lowry R.B. J. Electroanal. Chem. 217:1987;187.
22. Xu J., Li H.L., Zhang Y. J. Phys. Chem. 97:1993;11497.
23. Park S.G., Aoki K., Tokuda K., Matsuda H. J. Electroanal. Chem. 195:1985;157.
24. Zeng X., Bruckenstein S. J. Electrochem. Soc. 146:1999;2549.
25. Yamamoto H., Butera R.A., Gu Y., Waldeck D.H. Langmuir. 15:1999;8640.
26. Hofman S. Depth Profiling in AES and XPS. Briggs D., Seah M.P. Practical Surface Analysis. 1996;Wiley, Chichester, New York.
27. Laibinis P.E., Bain C.D., Whitesites G.M. J. Phys. Chem. 95:1991;7017.
28. Moulder J.F., Stickle W.F., Sobol P.E., Bomben K.D. Chastain J. Handbook of X-ray Photoelectron Spectroscopy. 1992;Perkin Elmer Corporation, Physical Electronics, Eden Prairie, MN.
29. J.L. García-Orozco, Master Thesis, University of Puerto Rico, 1997.
30. Oh S.J., Kim C.O., Prak J.W. Langmuir. 18:2002;1764.
31. Tutas D.J., Stromberg R., Passaglia E. SPE Trans. 4:1964;256.
32. Bascom W.D. Adv. Chem. Ser. 87:1968;38.
33. Wasserman S.R., Whitesides G.M., Tidswell I.M., Ocko B.M., Pershan P.S., Axe J.D. J. Am. Chem. Soc. 111:1989;5852.
34. Porter M.D., Bright T.B., Allara D.L., Chidsey C.E.D. J. Am. Chem. Soc. 109:1987;3559.
35. Bain C.D., Troughton E.B., Tao Y.T., Evall J., Whitesides G.M., Nuzzo R.G. J. Am. Chem. Soc. 111:1989;321.
36. Walczak M.M., Chung C., Stole S.M., Widrig C.A., Porter M.D. J. Am. Chem. Soc. 113:1991;2370.
37. Shi Z., Wu S., Lipkowski J. Electrochim. Acta. 40:1995;9.
38. Kallury K.M.R., Brennan J.D., Krull U. Anal. Chem. 67:1995;2625.