Molybdenum deposition on TiO2 (110) surfaces with different stoichiometries

Applied Surface Science

Volumn 142, Issue 1, 1999, Pages 114-119

  Petigny S ^a   Domenichini, B ^a   Mostefa Sba H ^a   Lesniewska, E ^b   Steinbrunn, A ^a   Bourgeois, S ^a  

^a LABORATOIRE INTERDISCIPLINAIRE CARNOT DE BOURGOGNE   (France)

^b UNIVERSITÉ DE BOURGOGNE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ARGON; DEPOSITION; FILM GROWTH; ION BOMBARDMENT; MOLYBDENUM; OXIDATION; OXYGEN; STOICHIOMETRY; SURFACE ROUGHNESS; SURFACES; TITANIUM DIOXIDE;

AMORPHOUS MOLYBDENUM OXIDE; ISLAND GROWTH; OXYGEN BOMBARDMENT; STRANSKI-KRASTANOV GROWTH MODE; ULTRATHIN MOLYBDENUM FILMS;

ULTRATHIN FILMS;

EID: 0141883072     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(98)00661-8     Document Type: Article

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