Optical multilayers for ultra-narrow bandpass filters fabricated by PICVD

Thin Solid Films

Volumn 442, Issue 1-2, 2003, Pages 189-193

  Bauer, S ^a   Klippe, L ^a   Rothhaar, U ^a   Kuhr, M ^a  

^a SCHOTT AG   (Germany)

Author keywords

Interfaces; Optical coatings; Optoelectronic devices; Plasma processing and deposition

Indexed keywords

ABSORPTION; BANDPASS FILTERS; DENSE WAVELENGTH DIVISION MULTIPLEXING; INTERFACES (MATERIALS); OPTICAL COATINGS; OPTOELECTRONIC DEVICES; PHYSICAL VAPOR DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SCATTERING;

PLASMA PROCESSING;

MULTILAYERS;

EID: 0141859799     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00981-7     Document Type: Conference Paper

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