Experimental evaluation of stopping power of high-energy ions from a laser-produced plasma by a magnetic field

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5037 I, Issue , 2003, Pages 370-377

  Niimi, Gohta ^a   Ueno, Yoshifumi ^b   Nishigori, Kentaro ^a   Aota, Tatsuya ^c   Yashiro, Hidehiko ^a   Tomie, Toshihisa ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

^c JAPAN SOCIETY FOR THE PROMOTION OF SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER CONCENTRATION; ELECTRONIC DENSITY OF STATES; HIGH ENERGY PHYSICS; IONS; MAGNETIC FIELD EFFECTS; MAGNETIC FIELD MEASUREMENT; MAGNETOHYDRODYNAMICS; TEMPERATURE;

DEBYE SCREENING DISTANCE; FARADAY CUP; HIGH ENERGY IONS; LORENTZ FORCE;

LASER PRODUCED PLASMAS;

EID: 0141836103     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.483747     Document Type: Conference Paper

References (9)

1. C.C. Walton et al., "Defect Production and Transport in an Ultra-Clean Ion-Beam Sputter Coating Process", International SEMATECH EUVL Source Workshop Dallas 2002.
2. B.A.M.Hansson et al., "Status of the liquid-xenon-jet laser-plasma source for EUV lithography", SPIE's 28th Annual International Symposium and Education Program on microlithography, Santa Clara 2003, 5037-96
3. H.Yashiro et al., "Ultra-fast debris shutter employing laser-produced plasma", SPIE's 28th Annual International Symposium and Education Program on microlithography, Santa Clara 2003, 5037-93
4. Francis F.Chen, "introduction to Plasma Physics and Contolled Fusion", New York and London, Plenum Press, pp.8-12
5. Gerard O'Sullivan and Padraig Dunne, "Spectroscopy of a 13.5 nm Laser Plasma Source", International SEMATECH EUVL Source Workshop Dallas 2002.
6. A.Kasperczuk et al., "Influence of the Illumination Characteristics on the Laser Plasma Dynamics in a Strong Axial Magnetic Field", Physica Scripta. Vol.54, 636-639, 1996
7. T.Tomie; Japanese Pat.2897005, US patent 6,275,565
8. Y.Ueno et al., "Debris-free EUV source using a through-hole tin target", SPIE's 28th Annual International Symposium and Education Program on microlithography, Santa Clara 2003, 5037-92
9. T. Aota et al., "Strong narrowband peak at 13.5-nm generated in a cavity-confined tin plasma", SPIE's 28th Annual International Symposium and Education Program on microlithography, Santa Clara 2003, 5037-91