XPS Study of N-Doped TiOx Thin Films Prepared by DC Reactive Magnetron Sputtering

Key Engineering Materials

Volumn 249, Issue , 2003, Pages 457-462

  Zhao, Q N ^a   Li, C L ^a   He, X ^a   Zhao, X J ^a  

^a WUHAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

D.C. reactive sputtering; Hydroxyl groups; N doped TiO2 films; XPS

Indexed keywords

BINDING ENERGY; COMPOSITION; DOPING (ADDITIVES); MAGNETRON SPUTTERING; SYNTHESIS (CHEMICAL); THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

REACTIVE SPUTTERING;

TITANIUM OXIDES;

EID: 0141828443     PISSN: 10139826     EISSN: 16629795     Source Type: Book Series    
DOI: None     Document Type: Conference Paper

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