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Journal of Physical Chemistry A

Volumn 107, Issue 16, 2003, Pages 2860-2864

σ and π relaxation of strain in three-membered ring molecules (CH2)2X, (NH)2X, and (SiH2) 2X (X = SiH2, PH, S)

(3) Naruse, Yuji a Ma, Jing b Inagaki, Satoshi a

a GIFU UNIVERSITY (Japan)

b NANJING UNIVERSITY (China)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTIONS; ELECTRONS; HYDROGEN; PROBLEM SOLVING; SILICON COMPOUNDS; STRAIN RATE;

ELECTRON DELOCALIZATION; HETEROATOMS; RING MOLECULES; RING STRAINS;

MOLECULAR DYNAMICS;

EID: 0141754577 PISSN: 10895639 EISSN: None Source Type: Journal
DOI: 10.1021/jp0210677 Document Type: Article

Times cited : (30)

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