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Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 4, 1998, Pages 2165-2170

Surface roughness of SiO2 from a remote microwave plasma enhanced chemical vapor deposition process

(4) Rack, M J a Vasileska, D a Ferry, D K a Sidorov, M a

a ARIZONA STATE UNIVERSITY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0141749971 PISSN: 10711023 EISSN: None Source Type: Journal
DOI: None Document Type: Article

Times cited : (9)

References (15)

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