Theoretical study of the ground and excited states of silicon clusters: Si8Hx

Journal of Applied Physics

Volumn 88, Issue 7, 2000, Pages 4340-4346

  Nakajima, Keizo ^a   Yoshizawa, Kazunari ^b,c   Yamabe, Tokio ^b,c  

^a PANASONIC CORPORATION   (Japan)

^b KYOTO UNIVERSITY   (Japan)

^c INSTITUTE FOR FUNDAMENTAL CHEMISTRY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0141731833     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1289048     Document Type: Article

References (21)

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