Applications of Atomic Layer Chemical Vapor Deposition for the Processing of Nanolaminate Structures

Korean Journal of Chemical Engineering

Volumn 19, Issue 3, 2002, Pages 451-462

  Yong, Kijung ^a   Jeong, Joonhee ^a  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

Author keywords

Atomic Layer Chemical Vapor Deposition; Capacitor Dielectric Thin Film; Gate Oxide; Nano Deposition; Self limiting Chemisorption

Indexed keywords

CAPACITORS; CHEMICAL VAPOR DEPOSITION; CHEMISORPTION; DIELECTRIC FILMS; FILM GROWTH; LAMINATES; MULTILAYERS; SUBSTRATES; SURFACE REACTIONS; THIN FILMS;

CHEMICAL PRECURSORS;

NANOSTRUCTURED MATERIALS;

EID: 0141731355     PISSN: 02561115     EISSN: None     Source Type: Journal    
DOI: 10.1007/BF02697156     Document Type: Article

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