Proximity effect correction on the multi-level interconnect metal for the high-energy electron-beam lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5037 II, Issue , 2003, Pages 1035-1042

  Magoshi, Shunko ^a   Sato, Shinji ^a   Tawarayama, Kazuo ^a   Makino, Yasuhiro ^a   Niiyama, Hiromi ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

Electron beam; High energy; Multi level interconnect metal; Proximity effect

Indexed keywords

ALGORITHMS; BACKSCATTERING; ELECTRON BEAMS; ELECTRONS;

ENERGY INTENSITY DISTRIBUTION; MULTI-LEVEL INTERCONNECT METAL; PROXIMITY EFFECT CORRECTION; SYSTEM ON CHIP PRODUCTS;

ELECTRON BEAM LITHOGRAPHY;

EID: 0141724570     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.483741     Document Type: Conference Paper

References (8)

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