Overlay considerations for 300mm lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5038 I, Issue , 2003, Pages 121-125

  Mono, Tobias ^a   Schröder, Uwe Paul ^a   Nees, Dieter ^a   Palitzsch, Katrin ^a   Köstler, Wolfram ^a   Bruch, Jens ^a   Kramp, Sirko ^a   Veldkamp, Markus ^a   Schuster, Ralf ^a  

^a INFINEON TECHNOLOGIES AG   (Germany)

Author keywords

300mm; Lithography; Overlay; Process induced; Systematical overlay error

Indexed keywords

DYNAMIC RANDOM ACCESS STORAGE; PHOTOLITHOGRAPHY; PRODUCT DEVELOPMENT; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON WAFERS; SPECIFICATIONS; SYSTEMATIC ERRORS;

CRITICAL DIMENSION; SYSTEMATICAL OVERLAY ERROR;

OPTICAL VARIABLES MEASUREMENT;

EID: 0141724476     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485019     Document Type: Conference Paper

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