NIST-traceable calibration of CD-SEM magnification using a 100 nm pitch standard

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5038 I, Issue , 2003, Pages 711-718

  Tortonese, M ^a   Guan, Y ^a   Prochazka, J ^a  

^a VLSI Research Inc   (United States)

Author keywords

100 nm; CD SEM; Litho metrology; Metrology; NIST traceability; Pitch

Indexed keywords

CALIBRATION; CONTAMINATION; DIFFRACTION GRATINGS; HYDROCARBONS; SCANNING ELECTRON MICROSCOPY;

BIAS; CRITICAL DIMENSION; MAGNIFICATION; PITCH STANDARD; TRACEABLE CALIBRATION;

OPTICAL VARIABLES MEASUREMENT;

EID: 0141723631     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.482648     Document Type: Conference Paper

References (5)

1. QS-9000 Measurement Systems Analysis Reference Manual, 2nd edition, 1995.
2. M. Tortonese, J. Prochazka, P. Konicek, J. Schneier, and I. R. Smith, "100 nm pitch standard characterization for metrology applications", Proc. SPIE, 4689, pp. 558-564, 2002.
3. Montgomery, D. C. Introduction to Statistical Quality control, 3rd ed., John Wiley, New York, 1997.
4. http://www.nist.gov/traceability/
5. Guide to the expression of uncertainty in measurement, ISO, Geneva, 1995.