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Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5039 II, Issue , 2003, Pages 1173-1180

High sensitivity nanocomposite resist materials for X-ray and EUV lithography

(5) Ali, Mohammad Azam a Gonsalves, Kenneth E a Batina, N b Golovkina, V c Cerrina, F c

a UNIVERSITY OF NORTH CAROLINA AT CHARLOTTE (United States)

b DEPARTAMENTO DE QUÍMICA (Mexico)

c UNIVERSITY OF WISCONSIN MADISON (United States)

Author keywords

EUV; Nanocomposites photoresist; NGL; Photo acid generator (PAG); Photolithography; Polymers; XRL

Indexed keywords

ACRYLIC MONOMERS; COMPOSITION EFFECTS; DEFECTS; NANOSTRUCTURED MATERIALS; SENSITIVITY ANALYSIS; SYNTHESIS (CHEMICAL); ULTRAVIOLET RADIATION; X RAY LITHOGRAPHY;

EXTREME ULTRAVIOLET LITHOGRAPHY; NANOCOMPOSITE RESIST MATERIALS; PHOTOACID GENERATOR; THIN FILM FORMATION;

PHOTORESISTS;

EID: 0141722627 PISSN: 0277786X EISSN: None Source Type: Conference Proceeding
DOI: 10.1117/12.485139 Document Type: Conference Paper

Times cited : (2)

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