Critical enabling properties of CaF2 lens blanks for state of the art lithography tools

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5040 II, Issue , 2003, Pages 734-741

  Hahn, Joerg ^a   Grabosch, Guenter ^a   Parthier, Lutz ^a   Knapp, Konrad ^a  

^a Schott Lithotec AG   (Germany)

Author keywords

CaF2; Crystal orientation; Intrinsic birefringence; Stress birefringence; Wavelength

Indexed keywords

BIREFRINGENCE; CALCIUM COMPOUNDS; NANOTECHNOLOGY; OPTICAL DESIGN; OPTICAL INSTRUMENT LENSES; OPTICAL PROPERTIES;

CALCIUM FLUORIDE LENS BLANK; CRITICAL ENABLING PROPERTIES; INTRINSIC BIREFRINGENCE; STRESS BIREFRINGENCE;

PHOTOLITHOGRAPHY;

EID: 0141722299     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485417     Document Type: Conference Paper

References (3)

1. Burnett et al.: Sematech 157 nm 1st Technical Data Review Meeting, 2001
2. Burnett et al.: Phys. Rev. B 64, Rapid Comm. 241102
3. Letz et al.: Sematech 157 nm 3rd Technical Data Review Meeting 2002