Removal of boron from metallurgical-grade silicon by applying CaO-based flux treatment

Yazawa International Symposium: Metallurgical and Materials Processing: Principles and Techologies; Materials Processing Fundamentals and New Technologies

Volumn 1, Issue , 2003, Pages 613-624

  Tanahashi, Mitsuru ^a   Nakahigashi, Hideo ^a   Takeda, Kunihiko ^a   Yamauchi, Chikabumi ^b  

^a NAGOYA UNIVERSITY   (Japan)

^b CHUBU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADDITION REACTIONS; BORON; FLUXES; LIME; METALLURGY; MOLTEN MATERIALS; OXIDATION; PURIFICATION; REMOVAL;

FLUX ADDITION; FLUX TREATMENT; METALLURGICAL GRADE SILICON; SIMULTANEOUS INJECTION PROCESS; TWO STAGE CONNECTING PROCESS;

SILICON;

EID: 0141682782     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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