Use of Asymmetric Dual-cavity Filters to Track Small H and L Variations as a Tool to Increase Yield of DWDM Fiters

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4998, Issue , 2003, Pages 178-185

  Pearson, David I C ^a   Luff, Paul ^a   Davis, Mervyn ^a   Howe, Arthur T ^b  

^a Nordiko Technical Services Ltd   (United Kingdom)

^b Hayward Business Center ^*

Author keywords

Asymmetric dual cavities; DWDM; Ion beam sputtering; Thin film filters; Uniformity

Indexed keywords

CALIBRATION; LIGHT SCATTERING; LIGHT TRANSMISSION; MULTILAYERS; OPTICAL FIBERS; OPTICAL FILTERS; SILICA; THIN FILMS;

ION BEAM SCATTERING;

WAVELENGTH DIVISION MULTIPLEXING;

EID: 0141678289     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.475756     Document Type: Conference Paper

References (4)

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2. D. Poitras, T. Cassidy and S Guetre, "Asymmetrical dual-cavity filters: Theory and Application," Optical Interference Coatings, 63, pp. MD3: 1-3, OSA Trends in Optics and Photonics, Optical Society of America, Washington, DC, 2001.
3. S. D. Smith, "Design of multilayer filters by considering two effective interfaces," J. Opt. Soc. Am. 48, pp.43-50, 1958.
4. H. A. Macleod and D. Richmond, "The effect of errors in optical monitoring of narrow-band all-dielectric thin film optical filters," Optica Acta, 21, pp. 429-443, 1974.