Debris-free EUV source using a through-hole tin target

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5037 II, Issue , 2003, Pages 750-758

  Ueno, Y ^a   Aota, T ^a   Niimi, G ^a   Lee, Dong Hoon ^a   Nishigori, K ^a   Yashiro, H ^a   Tomie, T ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Debris free; Double pulses; EUV; Laser produced plasma; Plasma light source

Indexed keywords

HEATING; IRRADIATION; LASER ABLATION; LASER PULSES; LIGHT SOURCES; PLASMA SOURCES; ULTRAVIOLET RADIATION;

DEBRIS FREE; DOUBLE PULSES LASER IRRADIATION; THROUGH HOLE METHOD;

LITHOGRAPHY;

EID: 0141612956     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.483746     Document Type: Conference Paper

References (4)

1. Tomie, Japanese Pat.2897005, US patent 6,275,565
2. Robert H. Day, "Photoemission Measurements for Low Energy X-Ray Detector Applications", Low Energy X-ray Diagnostics-1981, AIP Conference Proceedings Number 75, pp.44-48, 1981.
3. T.P. Hughes, "Plasmas and Laser Light", Adam Hilger Ltd., Bristol, UK, 1975.
4. B.L. Henke, E.M. gullikson, and J.C. Davis, "X-ray interactions:photoabsorption, scattering, transmission, and reflaction at E=50-30000eV, Z=1-92", Atomic Data and Nuclear Data Tables Vol.54(no.2), pp. 181-342, 1993.