Automatic gas-pressure regulator in a vacuum chamber

Journal of Optical Technology (A Translation of Opticheskii Zhurnal)

Volumn 64, Issue 1, 1997, Pages 66-67

  Vol'pyan, O D ^a   Yakovlev, P P ^b  

^a Polyus Research Institute   (Russian Federation)

^b OOO Fotron Avto   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0141606169     PISSN: 10709762     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (7)

1. P. P. Kremievskiǐ, Flowmeters and Quantity Meters (Mashinostroenie, Leningrad, 1989).
2. A. M. Grigor'ev, "Vacuum meters for modem vacuum processes," Elektron. Prom. No. 7 (135), 7 (1984).
3. E. M. Vrublevskiǐ, B. S. Danilin, and V. Yu. Kureev, "Measurement by thermistor-based sensors of gas flows used in plasma-etching processes," Élektron. Tekh. Ser. 3 No. 2 (104), 106 (1989).
4. D. A. Seǐdman and N. A. Smimova, "Monitoring gas conditions in vacuum apparatus," Elektron. Tekh. Ser. 2 No. 2 (175), 108 (1985).
5. B. S. Danilin, Using a Low-Temperature Plasma for Depositing Thin Films (Energoatomizdat, Moscow, 1989).
6. Y. Sallivan et al., "Flow Measurement and control in vacuum systems for microelectronic processing," Solid State Technol. 29, No. 10, 113 (1986).
7. E. A. Kramin and P. P. Yakovlev, "Estimating the effectiveness of interference coatings in the pumping systems of solid-state lasers," Vop. Radioélektron. Ser. Obshch. Vop. Radioélektron. No. 6, 120 (1989).