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note
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3. The TEM analysis was obtained in a Hitachi H-800 system, with accelerating voltage for electron beam of 200 kV. The preparation of sample for LRS analysis was the same as that for TEM, except for the substrate was glass. LRS was carried out on Renishaw 2000 system. XRD experiments were carried out using a Rigaku DMAX-2400 diffractometer with Cu Kα radiation. Characterization of electron diffraction is based on R = K/d (R is the distance between spot and (000), K is camera constant and d is the distance between crystal faces) and an important reference (J. Phys. Chem. B, 101, 3460 (1997)). The important data were listed as following. Lttice constants a = 5.10 Å, b = 8.40 Å, c = 6.02 Å, and camera constant K = 20.08 mm·Å. The standard d from JCPDS (84-1778) was applied to calibrate the diffraction spots.
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