Subfield scheduling for throughput maximization in electron-beam photomask fabrication

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5037 II, Issue , 2003, Pages 934-942

  Babin, Sergey ^a   Kahng, Andrew B ^b   Mǎndoiu, Ion I ^b   Muddu, Swamy ^b  

^a Soft Services   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTATIONAL COMPLEXITY; COMPUTER AIDED SOFTWARE ENGINEERING; COMPUTER SIMULATION; ELECTRIC HEATING; ELECTRON BEAMS; ELECTRONS; OPTIMIZATION; PHOTORESISTS; SEMICONDUCTOR DEVICE MANUFACTURE; SPATIAL VARIABLES CONTROL;

CRITICAL DIMENSION DISTORTION; ELECTRON BEAM PHOTOMASK FABRICATION; MASK WRITING; RESIST HEATING; SUBFIELD SCHEDULING; THROUGHPUT MAXIMIZATION;

MASKS;

EID: 0141501167     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.484981     Document Type: Conference Paper

References (10)

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