Candidate plasma-facing materials for EUV lithography source components

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5037 I, Issue , 2003, Pages 358-369

  Hassanein, A ^a   Burtseva, T ^a   Brooks, J N ^a   Konkashbaev, I ^a   Rice, B ^b  

^a ARGONNE NATIONAL LABORATORY   (United States)

^b INTEL CORPORATION   (United States)

Author keywords

Debris reduction; EUV source; Plasma facing components; Thermal shock resistance

Indexed keywords

COMPUTER SIMULATION; ELECTRIC DISCHARGES; ELECTRIC INSULATORS; ELECTRODES; EVAPORATION; LASER PRODUCED PLASMAS; MELTING; PLASMA GUNS; SPUTTERING; THERMAL LOAD; ULTRAVIOLET RADIATION;

DEBRIS REDUCTION; EXTREME ULTRAVIOLET SOURCES; SHORT PULSED PLASMA; STRUCTURAL FAILURE; THERMAL SHOCK RESISTANCE;

PHOTOLITHOGRAPHY;

EID: 0141497114     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.484928     Document Type: Conference Paper

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