Extensive studies of the plume deflection angle during laser ablation of Si target

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 7 A, 2003, Pages 4181-4186

  Perrone, Alessio ^a   Cultrera, Luca ^b   Dima, Alessandra ^b   Guido, Davide ^b   Zocco, Anna ^b   Conde, Jorge Carlos ^c   Gonzales, Pio ^c   Serra, Julia ^c   Léon, Betty ^c  

^a NATIONAL NANOTECHNOLOGY LABORATORY   (Italy)

^b UNIVERSITY OF SALENTO   (Italy)

^c UNIVERSITY OF VIGO   (Spain)

Author keywords

Deposition configuration; Frontal off axis deposition; Laser ablation; Plume deflection effect; SEM

Indexed keywords

CAMERAS; IRRADIATION; LASER ABLATION; LASER PULSES; PROFILOMETRY; SCANNING ELECTRON MICROSCOPY; SPECTROMETRY; SURFACE ROUGHNESS;

DIGITAL CAMERA; ION FLUX DISTRIBUTION; LASER DEPOSITION; LASER IRRADIATION; PLUME DETECTION EFFECT;

SEMICONDUCTING SILICON;

EID: 0141495027     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.4181     Document Type: Article

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