Application of high resolution-ICP-MS (sector field-ICP-MS) to the fast and sensitive quality control of process chemicals in semiconductor manufacturing

Fresenius' Journal of Analytical Chemistry

Volumn 360, Issue 7-8, 1998, Pages 800-803

  Wildner, Heiko ^a   Hearn, Ruth ^a  

^a RICARDO UK LTD   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0141477293     PISSN: 09370633     EISSN: None     Source Type: Journal    
DOI: 10.1007/s002160050811     Document Type: Conference Paper

References (7)

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5. Tittes W, Jakubowski N, Stüwer D, Tölg G, Broekart JAC (1994) J Anal At Spectrom 9:1015-1020
6. Vanhaecke F, Riondato J, Moens L, Dams R (1996) Fresenius J Anal Chem 355:397-400
7. Nakamura Y, Sigemori S, Takahashi T, Takaku Y, Simamura T (1993) Bunseki Kagaku 42:113-117