Polyelectrolyte effects in model photoresist developer solutions

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 4, 2003, Pages 1403-1410

  Prabhu, Vivek M ^a   Jones, Ronald L ^a   Lin, Eric K ^a   Wu, Wen Li ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CORRELATION METHODS; DISSOLUTION; IONIC STRENGTH; MONOMERS; POLYELECTROLYTES; POLYSTYRENES;

GYRATIONS;

PHOTORESISTS;

EID: 0141458245     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1591742     Document Type: Conference Paper

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