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Volumn 42, Issue 8 A, 2003, Pages
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Improved annealing process for electroless Pd plating induced crystallization of amorphous silicon
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Author keywords
Amorphous silicon; Electroless plating and physical vapor deposition; Metal induced crystallization; Polycrystalline silicon; Thin film transistor
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Indexed keywords
ANNEALING;
CRYSTALLIZATION;
ELECTROLESS PLATING;
LOW TEMPERATURE EFFECTS;
PALLADIUM;
PHYSICAL VAPOR DEPOSITION;
POLYCRYSTALLINE MATERIALS;
SCANNING ELECTRON MICROSCOPY;
THERMAL EFFECTS;
THIN FILM TRANSISTORS;
METAL INDUCED CRYSTALLIZATION;
PALLADIUM SILICIDE RESIDUE;
TETRAETHYLORTHOSILICATE OXIDE DEPOSITION;
AMORPHOUS SILICON;
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EID: 0141457571
PISSN: 00214922
EISSN: None
Source Type: Journal
DOI: 10.1143/jjap.42.l895 Document Type: Letter |
Times cited : (1)
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References (10)
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