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Volumn 42, Issue 8 A, 2003, Pages

Improved annealing process for electroless Pd plating induced crystallization of amorphous silicon

Author keywords

Amorphous silicon; Electroless plating and physical vapor deposition; Metal induced crystallization; Polycrystalline silicon; Thin film transistor

Indexed keywords

ANNEALING; CRYSTALLIZATION; ELECTROLESS PLATING; LOW TEMPERATURE EFFECTS; PALLADIUM; PHYSICAL VAPOR DEPOSITION; POLYCRYSTALLINE MATERIALS; SCANNING ELECTRON MICROSCOPY; THERMAL EFFECTS; THIN FILM TRANSISTORS;

EID: 0141457571     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.l895     Document Type: Letter
Times cited : (1)

References (10)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.