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Applied Physics Letters

Volumn 50, Issue 26, 1987, Pages 1879-1881

Characterization of reactively sputtered ruthenium dioxide for very large scale integrated metallization

(3) Krusin Elbaum, L a Wittmer, M a Yee, D S a

a IBM T J WATSON RESEARCH CENTER (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0141444497 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.97673 Document Type: Article

Times cited : (143)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.