A Mechanism of the Relief-Phase Structure Formation in Self-Developing Photopolymers

Optics and Spectroscopy (English translation of Optika i Spektroskopiya)

Volumn 93, Issue 1, 2002, Pages 126-131

  Smirnova, T N ^a   Sakhno, O V ^a  

^a INSTITUTE OF PHYSICS   (Ukraine)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; PHOTOSENSITIVITY; POLYMERIZATION;

PHOTOPOLYMERS;

POLYMERS;

EID: 0141427846     PISSN: 0030400X     EISSN: None     Source Type: Journal    
DOI: 10.1134/1.1496735     Document Type: Article

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