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Volumn 2998, Issue , 1997, Pages 146-153
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Structural defect control and photosensitivity in reactively sputtered germanosilicate glass films
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Author keywords
Germanosilicate; Glass; Photosensitivity; Point defects; Reactive atmosphere sputtering; Thin film
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Indexed keywords
DEFECT STRUCTURES;
DEFECTS;
ELECTRODEPOSITION;
ELECTRON RESONANCE;
GERMANIUM;
GLASS;
HYDROGEN;
LIGHT REFRACTION;
LIGHT SENSITIVE MATERIALS;
MATERIALS;
MODULATION;
OPTICAL MATERIALS;
OXYGEN;
PARAMAGNETIC RESONANCE;
PARAMAGNETISM;
PHOTOSENSITIVITY;
POINT DEFECTS;
REFRACTIVE INDEX;
REFRACTOMETERS;
SUBSTRATES;
THIN FILM DEVICES;
THIN FILMS;
ALLOY TARGET;
CHEMICAL REDUCTIONS;
DEFECT CENTERS;
DEFECT MODELING;
DEFECT STATES;
GERMANOSILICATE;
GERMANOSILICATE GLASSES;
GLASS STRUCTURES;
HYDROGEN LOADINGS;
INDEX MODULATIONS;
INDEX STRUCTURES;
INJECTION TECHNIQUES;
MATERIAL STRUCTURES;
OXYGEN DEFICIENT CENTER (ODC);
REACTIVE ATMOSPHERE SPUTTERING;
STRUCTURAL DEFECTS;
SUBSTRATE TEMPERATURE (ST);
SYNTHESIS TECHNIQUES;
THIN FILM;
PHOTOSENSITIVE GLASS;
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EID: 0043256089
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.264176 Document Type: Conference Paper |
Times cited : (6)
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References (14)
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