Low-stress superhard Ti-B films prepared by magnetron sputtering

Surface and Coatings Technology

Volumn 174-175, Issue , 2003, Pages 744-753

  Kunc, F ^a   Musil, J ^a   Mayrhofer, P H ^b   Mitterer, C ^b  

^a UNIVERSITY OF WEST BOHEMIA   (Czech Republic)

^b UNIVERSITY OF LEOBEN   (Austria)

Author keywords

Macrostress; Magnetron sputtering; Structure; Superhard films; Ti B alloy

Indexed keywords

CURRENT DENSITY; ELASTIC MODULI; FILM GROWTH; FILMS; INDENTATION; ION BOMBARDMENT; LIGHT REFLECTION; MAGNETRON SPUTTERING; MICROHARDNESS; POISSON RATIO; STOICHIOMETRY; TEMPERATURE; VICKERS HARDNESS TESTING; X RAY DIFFRACTION ANALYSIS;

MACROSTRESSES;

TITANIUM ALLOYS;

COATING; INDUSTRIAL APPLICATION; PLASMA; SURFACE PROPERTY;

EID: 0043241775     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00425-0     Document Type: Article

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