Assessment of conservative weighting scheme in simulating chemical vapour deposition with trace species

International Journal for Numerical Methods in Fluids

Volumn 43, Issue 1, 2003, Pages 93-114

  Wu, J S ^a   Hsiao, W J ^a   Lian, Y Y ^a   Tseng, K C ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

Conservative weighting scheme; Extended conservative weighting scheme; LPCVD; Reactive; Single cell simulation; Trace species

Indexed keywords

COMPUTER SIMULATION; SURFACE REACTIONS; ULTRAHIGH VACUUM;

TRACE SPECIES;

CHEMICAL VAPOR DEPOSITION;

CHEMICAL VAPOR DEPOSITION; GAS FLOW; NAVIER-STOKES EQUATIONS;

EID: 0043239142     PISSN: 02712091     EISSN: None     Source Type: Journal    
DOI: 10.1002/fld.609     Document Type: Article

References (24)

1. Hitchman E, Jensen K. Chemical Vapour Deposition: An Overview in Chemical Vapour Deposition: Principles and Applications. Hitchman M, Jensen K (eds). Academic Press: New York, 1993.
2. Coronell DG. Simulation and analysis of rarefied gas flows in chemical vapour deposition processes. Ph.D. Thesis, MIT, 1993.
3. Kleijn CR. A mathematical model of the hydrodynamics and gas-phase reactions in silicon LPCVD in a single-wafer reactor. Journal of the Electrochemical Society 1991; 138(7):2190-2200.
4. Coltrin ME, Kee RJ. A mathematical model of the gas-phase and surface chemistry in GaAs MOCVD. Material Research Society Symposium Proceedings 1989; 145:119.
5. Coltrin ME, Kee RJ, Evans GH. A mathematical model of the fluid mechanics and gas-phase chemistry in a rotating-disk chemical vapour deposition reactor. Journal of the Electrochemical Society 1989; 136(3):819-829.
6. Moffat HK, Jensen KF. Three-dimensional flow effects in silicon CVD in horizontal reactors. Journal of the Electrochemical Society 1988; 135(2):459-471.
7. Wang YB, Chaussavoine C, Teyssandier F. 2D modelling of a non-confined circular impinging jet reactor; Si chemical vapour deposition. Journal of Crystal Growth 1993; 126:373-395.
8. Coronell DG, Jensen KF. Simulation of rarefied gas transport and profile evolution in nonplanar substrate chemical vapour deposition. Journal of the Electrochemical Society 1994; 141(9):2545-2551.
9. Nanbu K, Igarashi S, Watanabe Y. Molecular simulation of film growth rate in the low-pressure CVD method. JSME International Journal Series B-Fluids & Thermal Engineering 1990; 56(524):892-897.
10. Nanbu K, Mitamura S, Igarashi S. Growth rate of silicon films on a wedge-shaped substrate in the LP-CVD reactor. JSME International Journal Series B-Fluids & Thermal Engineering 1991; 57(542 ):3526-3530.
11. Nanbu K, Sugawara T, Igarashi S. Monte Carlo simulation of the growth rate of films in a CVD diffusion reactor. JSME International Journal Series B-Fluids & Thermal Engineering 1991; 57(543 ):3760-3764.
12. Ikegawa M, Kobayashi J. Semiconductor deposition profile simulation using direct simulation Monte Carlo method. JSME International Journal Series B-Fluids & Thermal Engineering 1993; 59(567 ):3365-3371.
13. Masato I, Junichi K. Deposition profile simulation using the direct simulation. Journal of the Electrochemical Society 1989; 136(10):2982-2986.
14. Nance RP. Monte Carlo simulation of three-dimensional hypersonic flows on parallel architectures. Master Thesis, North Carolina State University, 1995.
15. Kannenberg KC. Computational method for the direct simulation Monte Carlo technique with application to plume impingement. Ph.D. Thesis, Cornell University, Ithaca, NY 1998.
16. Plimpton S, Bartel T. Parallel particle simulation of low-density fluid flows. U.S. Department of Energy Report No. DE94-007858, 1993.
17. Wu JS, Tseng KC. Analysis of micro-scale gas flows with pressure boundaries using direct simulation Monte Carlo method. Computers & Fluids 2001; 30:711-735.
18. Bird GA. Molecular Gas Dynamics and the Direct Simulation of Gas Flows. Oxford University Press: New York, UK, 1994.
19. Boyd ID, Stark JPW. Direct simulation of chemical reactions. Journal of Thermophysics 1990; 4(3):391-393.
20. Boyd ID. Conservative species weighting scheme for the direct simulation Monte Carlo method. Journal of Thermophysics and Heat Transfer 1996; 10(4):579-585.
21. Sakiyama Y, Takagi S, Matsumoto Y. Full simulation of silicon chemical vapour deposition process. In 22nd International Symposium on Rarefied Gas Dynamics, Bartel TJ, Gallis MA (ed.). 2000; 206-213.
22. Bird GA. Molecular Gas Dynamics. Oxford University Press: Oxford, England, UK, 1976.
23. Bird GA. Monte Carlo simulation in an engineering context. In Progress in Astronautics and Aeronautics: Rarefied Gas Dynamics, vol. 74, Pt. 1, Sam S. Fisher (ed.). AIAA: New York, 1981; 239-255.
24. Hsu CC. Molecular simulation of monosilane gas-phase decomposition and diffusion by DSMC. Master Thesis, Department of Chemical Engineering. National Taiwan University of Science and Technology, 1997.