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Materials Science and Engineering B

Volumn B54, Issue 1-2, 1998, Pages 18-23

Proton-implantation-induced optical phenomena in SiO2:GeO2 glasses: Formation of photosensitive defects and nanometer sized Ge crystals

(4) Kawamura, Ken Ichi a Kameshima, Yoshikazu a Hosono, Hideo a Kawazoe, Hiroshi a

a TOKYO INSTITUTE OF TECHNOLOGY (Japan)

Author keywords

Photosensitive defects; Proton implanation; SiO2:GeO2 glasses

Indexed keywords

GERMANIUM COMPOUNDS; ION IMPLANTATION; NANOSTRUCTURED MATERIALS; OXIDES; PHOTOSENSITIVITY; PROTONS; SILICA;

OXIDE GLASS;

GLASS;

EID: 0043236281 PISSN: 09215107 EISSN: None Source Type: Journal
DOI: 10.1016/s0921-5107(98)00017-8 Document Type: Article

Times cited : (5)

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