A high-voltage scanning electron microscopy system for in situ electromigration testing

Review of Scientific Instruments

Volumn 71, Issue 7, 2000, Pages 2848-2854

  Doan, J C ^a   Lee, S ^a   Lee, S H ^a   Meier, N E ^a   Bravman, J C ^a   Flinn, P A ^a   Marieb, T N ^b   Madden, M C ^c  

^a Stanford University   (United States)

^b INTEL CORPORATION   (United States)

^c Engineering Consultant   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0043184588     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1150702     Document Type: Article

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