메뉴 건너뛰기




Volumn 35, Issue 1-3, 1996, Pages 136-140

Multilayer ISFET membranes for microsystems applications

Author keywords

Microsystem applications; Multilayer ISFET membranes

Indexed keywords

BIOSENSORS; CHEMICAL SENSORS; CMOS INTEGRATED CIRCUITS; ION SELECTIVE MEMBRANES;

EID: 0043139014     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-4005(97)80043-3     Document Type: Article
Times cited : (31)

References (9)
  • 2
    • 0040598366 scopus 로고
    • Multiple ISFET with integrated circuits
    • Fukoaka Japan
    • W. Ko, C. Fung, D. Yu and Y. Xu, Multiple ISFET with integrated circuits, Proc. Int. Meet. Chem Sensors, Fukoaka Japan, 1983, pp. 496-500.
    • (1983) Proc. Int. Meet. Chem Sensors , pp. 496-500
    • Ko, W.1    Fung, C.2    Yu, D.3    Xu, Y.4
  • 3
    • 0022559381 scopus 로고
    • An integrated sensor for electrochemical measurements
    • R. Smith and D. Scott, An integrated sensor for electrochemical measurements, IEEE Trans. Biomed. Eng., 33 (1986) 83-90.
    • (1986) IEEE Trans. Biomed. Eng. , vol.33 , pp. 83-90
    • Smith, R.1    Scott, D.2
  • 5
    • 0023867326 scopus 로고
    • A process for the combined fabrication of ion sensors and CMOS circuits
    • L Bousse, J. Shott and J. Meindl, A process for the combined fabrication of ion sensors and CMOS circuits. IEEE Electron. Device Lett., 9 (1988) 44-46.
    • (1988) IEEE Electron. Device Lett. , vol.9 , pp. 44-46
    • Bousse, L.1    Shott, J.2    Meindl, J.3
  • 6
    • 0024627338 scopus 로고
    • A CMOS-integrated "ISFET-operational amplifier" chemical sensor employing differential sensing
    • H. Wong and M. White, A CMOS-integrated "ISFET-operational amplifier" chemical sensor employing differential sensing, IEEE Trans Electron. Devices, 36 (1989) 479-487.
    • (1989) IEEE Trans Electron. Devices , vol.36 , pp. 479-487
    • Wong, H.1    White, M.2
  • 9
    • 0023867326 scopus 로고
    • A process for the combined fabrication of ion sensors and CMOS circuits
    • L. Bousse, J. Shott and J.D. Meindl, A process for the combined fabrication of ion sensors and CMOS circuits, IEEE Electron. Device Lett., 9 (1988) 44-46.
    • (1988) IEEE Electron. Device Lett. , vol.9 , pp. 44-46
    • Bousse, L.1    Shott, J.2    Meindl, J.D.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.