The Effect of Surface Treatments and Growth Conditions on Electrical Characteristics of Thick (>50 nm) Gate Oxides

Journal of the Electrochemical Society

Volumn 148, Issue 9, 2001, Pages

  Wu, C T ^a   Ridley, R ^b   Roman, P ^a   Dolny, G ^b   Grebs, T ^b   Hao, J ^b   Ruzyllo, J ^a  

^a The Pennsylvania State University   (United States)

^b FAIRCHILD SEMICONDUCTOR   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0043134827     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1390347     Document Type: Article

References (11)

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