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Volumn 79, Issue 6, 1996, Pages 3089-3093

Determination of the relative densities of high-voltage stressed-generated traps near the anode and cathode in 10-nm-thick silicon oxides

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[No Author keywords available]

Indexed keywords


EID: 0043080054     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.361251     Document Type: Article
Times cited : (8)

References (26)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.