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Volumn 79, Issue 6, 1996, Pages 3089-3093
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Determination of the relative densities of high-voltage stressed-generated traps near the anode and cathode in 10-nm-thick silicon oxides
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Author keywords
[No Author keywords available]
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Indexed keywords
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EID: 0043080054
PISSN: 00218979
EISSN: None
Source Type: Journal
DOI: 10.1063/1.361251 Document Type: Article |
Times cited : (8)
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References (26)
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