Polymer protective coating for wet deep silicon etching processes

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4979, Issue , 2003, Pages 79-86

  Spencer, Mary ^a   Ruben, Kim ^a   Li, Chenghong ^a   Williams, Paul ^a   Flaim, Tony ^a  

^a BREWER SCIENCE INC   (United States)

Author keywords

Bulk micromachining; Deep silicon etching; Hydrofluoric acid; Potassium hydroxide etchant

Indexed keywords

ETCHING; HYDROFLUORIC ACID; MICROELECTROMECHANICAL DEVICES; MICROMACHINING; MULTILAYERS; POTASSIUM COMPOUNDS; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON NITRIDE; SUBSTRATES;

AQUEOUS ACID; DEEP SILICON ETCHING; MULTILAYER COATING SYSTEM; POTASSIUM HYDROXIDE ETCHANT;

PLASTIC COATINGS;

EID: 0043065311     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.472717     Document Type: Conference Paper

References (2)

1. U.S. Patent No. 5,501,893; F. Laermer and A. Schilp, March 26, 1996.
2. U.S. Patent No. 4,332,881; T.A. Shankoff, June 1, 1982.