Chemical mechanical planarization: An effective microfabrication and micromachining technology for MEMS

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4979, Issue , 2003, Pages 119-128

  Lee, Juikun ^a   Myers, Ronald ^a   Dear, Tina ^a   Gensler, Carl ^a  

^a CABOT MICROELECTRONICS CORPORATION   (United States)

Author keywords

Ceramic; CMP; MEMS; Metal; MOEMS; Planarization; Polymer

Indexed keywords

ALUMINA; COPPER; INTEGRATED CIRCUIT MANUFACTURE; MICROELECTROMECHANICAL DEVICES; MICROMACHINING; POLYIMIDES; SUBSTRATES;

CHEMICAL MECHANICAL PLANARIZATION; MICROFABRICATION; SEMICONDUCTOR INDUSTRY;

CHEMICAL MECHANICAL POLISHING;

EID: 0043065310     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.478291     Document Type: Conference Paper

References (11)

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