Study of Biaxial Stress Induced by Cosputtered Thin Molybdenum Suicide Films in Silicon Single-Crystal Substrates

Journal of Applied Crystallography

Volumn 29, Issue 3, 1996, Pages 222-229

  Lal, Krishan ^a   Mitra, Reshmi ^a   Srinivas, G ^b   Vankar, V D ^b  

^a NATIONAL PHYSICAL LABORATORY   (India)

^b INDIAN INSTITUTE OF TECHNOLOGY DELHI   (India)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0043022276     PISSN: 00218898     EISSN: None     Source Type: Journal    
DOI: 10.1107/s0021889895009745     Document Type: Article

References (21)

1. Angillelo, J., D'heurle, F., Peterson, S. & Segmuller, A. (1980). J. Vac. Sci. Technol. 17, 471-475.
2. Batterman, B. W. & Cole, H. (1964). Rev. Mod. Phys. 36, 681-717.
3. Bohg, A. (1978). Phys. Status Solidi A, 46, 445-450.
4. Bonse, U. K. (1962). Direct Observation of Imperfections in Crystals, edited by J. B. Newkirk & J. H. Wernick, pp. 431-460. New York: Interscience.
5. Bonse, U. K., Hart, M. & Newkirk, J. B. (1967). Adv. X-ray Anal. 10, 1-8.
6. Brantley, W. A. (1973). J. Appl. Phys. 44, 534-535.
7. Glang, R., Holmwood R. A. & Rosenfeld, R. L. (1965). Rev. Sci. Instrum. 36, 7-10.
8. Goswami, S. N. N., Lal, K., Wurfl, J. & Hartnagel, H. L. (1993). Physics of Semiconductor Devices, edited by K. Lal, pp. 427-430. New Delhi: Narosa Publishing House.
9. Halder, S. K., Kumar, V., Lal, K., Kumar, V. & Agnihotri, O. P. (1993). Physics of Semiconductor Devices, edited by K. Lal, pp. 340-342. New Delhi: Narosa Publishing House.
10. Holmwood, R. A. & Glang, R. (1965). J. Electrochem. Soc. 112, 827-831.
11. Kohra, K. & Kikuta, S. (1968). Acta Cryst. A24, 200-205.
12. Lal, K., Goswami, S. N. N., Wurfl, J. & Hartnagel, H. L. (1989). J. Semicond. Mater. Devices, 1, 124-134.
13. Lal, K., Goswami, S. N. N., Wurfl, J. & Hartnagel, H. L. (1990). J. Appl. Phys. 67, 4105-4113.
14. Lal, K. & Kumar, V. (1985). NPL Technical Report. Report No. NPL B4-0056. National Physical Laboratory, New Delhi, India.
15. Murarka, S. P., Fraser, D. B., Retaczyk, T. F. Jr & Sheng, T. T. (1980). J. Appl. Phys. 51, 5380-5385.
16. Pick, M. A., Bickmann, K., Pofahl, E., Zwoll, K. & Wenzl, H. (1977). J. Appl. Cryst. 10, 450-457.
17. Rozgonyi, G. A. & Ciesielka, T. J. (1973). Rev. Sci. Instrum. 44, 1053-1057.
18. Schwuttke, G. H. & Howard, J. K. (1968). J. Appl. Phys. 39, 1581-1591.
19. Segmuller, A. (1982). Synthesis, Crystal Growth and Characterization, edited by K. Lal, pp. 243-259. Amsterdam: North-Holland.
20. Tanner, B. K. (1976). X-ray Diffraction Topography. Oxford: Pergamon Press.
21. Wasa, K. (1978). Thin Solid Films, 52, 31-43.