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Volumn 13, Issue 2 III, 2003, Pages 2643-2645

The progress made using the Combustion Chemical Vapor Deposition (CCVD) technique to fabricate YBa2Cu3O7-x coated conductors

Author keywords

Buffer layers; Combustion chemical vapor deposition; Microcoating technologies; Superconductor; YBCO

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CURRENT DENSITY; ELECTRIC CONDUCTORS; EPITAXIAL GROWTH; PULSED LASER DEPOSITION;

EID: 0042977337     PISSN: 10518223     EISSN: None     Source Type: Journal    
DOI: 10.1109/TASC.2003.811935     Document Type: Conference Paper
Times cited : (3)

References (4)
  • 3
    • 0001155311 scopus 로고
    • Combustion chemical vapor deposition: A novel thin-film deposition technique
    • July
    • A. T. Hunt, W. B. Carter, and J. K. Cochran Jr., "Combustion chemical vapor deposition: A novel thin-film deposition technique," Appl. Phvs. Lett, vol. 63, pp. 266-268, July 1993.
    • (1993) Appl. Phvs. Lett , vol.63 , pp. 266-268
    • Hunt, A.T.1    Carter, W.B.2    Cochran J.K., Jr.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.