A study on oxide film growth on Nd surface using XPS

Wuli Xuebao/Acta Physica Sinica

Volumn 50, Issue 1, 2001, Pages 81-82

  Li, Ya ^a   Chen, Ling Yan ^a   Zhang, Zhe ^a   Wu, Yong Gang ^a   Qiao, Yi ^a   Xu, Wei Xin ^b  

^a TONGJI UNIVERSITY   (China)

^b Key Lab of Metal Functional Mat   (China)

Author keywords

Nd; Oxidation; X ray photoelectron spectroscopy

Indexed keywords

EID: 0042917647     PISSN: 10003290     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (4)

1. B. J. MacGowan et al., Phys. Fluids, B4(1992), 2326.
2. Z. Zhang. L. Y. Chen et al., Acta Physica Sinica, 49 (2000), 527(in Chinese) [ft W, B£ #&%.tlS««, 49(2000), 527.]
3. N. Cabrera, N. F. Mott, Rep. Prog. Phys., 12(1948), 163.