Charge storage and transportation in double layers of Si3N4/SiO2 electret film based on Si substrate

Wuli Xuebao/Acta Physica Sinica

Volumn 50, Issue 2, 2001, Pages 297-298

  Zhang, Xiao Qing ^a   Sessler, G M ^b   Xia, Zhong Fu ^a   Zhang, Ye Wen ^a  

^a TONGJI UNIVERSITY   (China)

^b DARMSTADT UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

Charge storage; Electret; Film; Thermal iron emission

Indexed keywords

EID: 0042911608     PISSN: 10003290     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (9)

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