Formation of an intermetallic phase by crystallization in the Cr-Si-Ni-Al amorphous film

Journal of Alloys and Compounds

Volumn 359, Issue 1-2, 2003, Pages 256-260

  Dong, Xianping ^a   Wu, Jiansheng ^a  

^a SHANGHAI JIAO TONG UNIVERSITY   (China)

Author keywords

Amorphous films; Crystallization; Growth; Intermetallic phase; Nucleation

Indexed keywords

ANNEALING; CHROMIUM ALLOYS; CRYSTAL MICROSTRUCTURE; CRYSTALLIZATION; ELECTRIC CONDUCTIVITY; FILM GROWTH; INTERMETALLICS; NUCLEATION; TRANSMISSION ELECTRON MICROSCOPY;

CRYSTALLIZATION PHASES;

AMORPHOUS FILMS;

EID: 0042863048     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-8388(03)00178-6     Document Type: Article

References (7)

1. Heinrich A., Schumann J., Vinzelberg H., Brüstel U., Gladun C. Thin Solid Films. 223:1993;311.
2. Hieber K., Dittmann R. Thin Solid Films. 36:1976;357.
3. Glang R., Holmwood R.A., Herd S.R. J. Vac. Sci. Technol. 4:1967;163.
4. Heinrich A., Gladun C., Monch I. Int. J. Electron. 73:1992;883.
5. Bäther K.H., Zies G., Voigtmann R., Moldenhauer W., Schreiber H. Thin Solid Films. 188:1990;67.
6. Nava F., Tien T., Tu K.N. J. Appl. Phys. 57:(6):1985;2018.
7. Kissinger H.E. J. Res. Natl. Bur. Stand. 57:(4):1956;217.