Standing-wave interferometer

Applied Physics Letters

Volumn 83, Issue 1, 2003, Pages 12-14

  Stiebig, H ^a   Buchner H ^b   Bunte, E ^a   Mandryka, V ^b   Knipp, D ^c   Jager G ^b  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

^b ILMENAU UNIVERSITY OF TECHNOLOGY   (Germany)

^c JACOBS UNIVERSITY BREMEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; ELECTROMAGNETIC WAVE INTERFERENCE; INTERFEROMETERS; LIGHT PROPAGATION; MIRRORS; PHASE SHIFT; PHOTOCURRENTS; STANDING WAVE METERS;

WAVE SUPERPOSITION;

OPTICAL SENSORS;

EID: 0042842441     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1590732     Document Type: Article

References (6)

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4. H.-J. Büchner, H. Stiebig, V. Mandryka, E. Bunte, and G. Jäger, Meas. Sci. Technol. 14, 311 (2003).
5. W. Luft and Y. Tuso, Hydrogenated Amorphous Silicon Alloy Deposition Processes (Marcel Dekker, New York, 1993).
6. O. Kluth, A. Löffl, S. Wieder, C. Beneking, L. Houben, B. Rech, H. Wagner, S. Waser, J. A. Selvan, and H. Keppner, Proc. 26th IEEE PVSEC (1997) pp. 715-718.