Optimization of SERS-active substrates for near-field Raman spectroscopy

Synthetic Metals

Volumn 139, Issue 3, 2003, Pages 621-624

  Grand, J ^a   Kostcheev, S ^a   Bijeon, J L ^a   De la Chapelle, M Lamy ^a   Adam, P M ^a   Rumyantseva, A ^a   Lerondel G ^a   Royer, P ^a  

^a UNIVERSITÉ DE TECHNOLOGIE DE TROYES   (France)

Author keywords

Electron beam lithography; Surface enhanced Raman scattering; Surface plasmons

Indexed keywords

ANNEALING; ELECTRON BEAM LITHOGRAPHY; OPTIMIZATION; SUBSTRATES; SURFACE PLASMON RESONANCE; SURFACE ROUGHNESS;

TAPPING MODES;

RAMAN SPECTROSCOPY;

EID: 0042830569     PISSN: 03796779     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0379-6779(03)00276-5     Document Type: Conference Paper

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