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Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 16, Issue 3, 1998, Pages 1676-1679

Pulsed supersonic molecular beam growth of AIN

(2) Ballarotto, V W a Kordesch, M E a

a OHIO UNIVERSITY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALN FILMS; AVERAGE GROWTH RATE; BASAL PLANES; BEAM PATH; DEPOSITION TIME; FILM COMPOSITION; LATTICE-PARAMETER RATIO; NON-POLAR; POST-DEPOSITION; PRECURSOR FLUX; PULSE RATE; REFLECTANCE SPECTROSCOPY; SAPPHIRE SUBSTRATES; SILICON SUBSTRATES; SUBSTRATE TEMPERATURE; SUPERSONIC FREE JETS; SUPERSONIC MOLECULAR BEAM; TEMPERATURE RANGE; TRIMETHYLALUMINUM;

AMMONIA; AUGER ELECTRON SPECTROSCOPY; CHEMICAL VAPOR DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SPECTROSCOPY; SUBSTRATES; SUPERSONIC AERODYNAMICS; THERMOANALYSIS;

FILM GROWTH;

EID: 0042828538 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.581141 Document Type: Article

Times cited : (6)

References (10)

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