Electron attachment to NO in supercritical ethane

Journal of Physical Chemistry B

Volumn 102, Issue 21, 1998, Pages 4189-4192

  Nishikawa, Masaru ^a   Holroyd, Richard ^b   Itoh, Kengo ^c  

^a KANAGAWA INSTITUTE OF TECHNOLOGY   (Japan)

^b BROOKHAVEN NATIONAL LABORATORY   (United States)

^c UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0042804606     PISSN: 15206106     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp980285q     Document Type: Article

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