Effect of surface pressure on the insulator to metal transition of a langmuir polyaniline monolayer

Journal of the American Chemical Society

Volumn 125, Issue 31, 2003, Pages 9312-9313

  Zhang, Jie ^a   Barker, Anna L ^a   Mandler, Daniel ^a,b   Unwin, Patrick R ^a  

^a UNIVERSITY OF WARWICK   (United Kingdom)

^b HEBREW UNIVERSITY OF JERUSALEM   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

CARBOXYLIC ACID DERIVATIVE; FERROCENE; METAL; POLYANILINE;

ARTICLE; ELECTRIC CONDUCTIVITY; ELECTRIC CURRENT; ELECTRICITY; ELECTRONICS; FILM; INSULATOR TO METAL TRANSITION; LANGMUIR FILM; OXIDATION; PRESSURE; SCANNING ELECTROCHEMICAL MICROSCOPY; SCANNING ELECTRON MICROSCOPY; SURFACE PROPERTY;

EID: 0042709549     PISSN: 00027863     EISSN: None     Source Type: Journal    
DOI: 10.1021/ja036146q     Document Type: Article

References (24)

1. Yang, Y.; Heeger, A. J. Nature 1994, 372, 344.
2. See, for example: Gustafsson, G.; Cao, Y.; Treacy, G. M.; Klavetter, F.; Colaneri, N.; Heeger, A. J. Nature 1992, 357, 477.
3. Gratzel, M. Nature 2001. 414, 338.
4. Jager, E. W. H.; Smela, E.; Inganas, O. Science 2000, 290, 1540.
5. Bianco, B.; Bonfiglio, A. Thin Solid Films 1996, 285, 520.
6. Paloheimo, J.; Pal, A. J.; Stubb, H. J. Appl. Phys. 1996, 79, 7800.
7. Mello, S. V.; Dhanabalan, A.; Oliveira, O. N. Synth. Met. 1999, 102, 1433.
8. Dhanabalan, A.; Dabke, R. B.; Kumar, N. P.; Talwar, S. S.; Major, S.; Lal, R.; Contractor, A. Q. Langmuir 1997, 13, 4395.
9. Reitzel, N.; Greve, D. R.; Kjaer, K.; Hows, P. B.; Jayaraman, M.; Savoy, S.; Mccullough, R. D.; McDevitt, J. T.; Bjornholm, T. J. Am. Chem. Soc. 2000, 122, 5788.
10. Granholm, P.; Paloheimo, J.; Stubb, H. Phys. Reb. B 1997, 55, 13658.
11. Lui, C. Y.; Bard, A. J. Nature 2002, 418, 162.
12. Basescu, N.; Lui, Z.-X.; Moses, D.; Heeger, A. J.; Naarmann, H.; Theophilou, N. Nature 1987, 327, 403.
13. Bard, A. J., Mirkin, M. V., Eds. Scanning Electrochemical Microscopy; Marcel Dekker: New York, 2001.
14. (a) Slevin, C. J.; Unwin, P. R. J. Am. Chem. Soc. 2000, 122, 2597.
15. (b) Quinn, B. M.; Prieto, I.; Haram, S. K.; Bard, A. J. J. Phys. Chem. B 2001, 105, 7474.
16. (a) Charych, D. H.; Landau, E. M.; Majda, M. J. Am. Chem. Soc. 1991, 113, 3340.
17. (b) Forster, R. J.; Keyes, T. E.; Majda, M. J. Phys. Chem. B 2000, 104, 4425.
18. Kwak, J.; Bard, A. J. Anal. Chem. 1989, 61, 1221.
19. The normalized distance is the separation between the microelectrode and the PAN monolayer divided by the microelectrode radius, while the normalized current is the measured current divided by the steady-state current far from the interface.
20. Wipf, D. O.; Bard, A. J. J. Electrochem. Soc. 1991, 138, 469.
21. Selzer, Y.; Turyan, I.; Mandler, D. J. Phys. Chem. B 1999, 103, 1509.
22. Huang, W. S.; Humphery, B. D.; MacDiarmid, A. G. J. Chem. Soc., Faraday Trans. 1 1986, 82, 2385.
23. Epstein, A. J.; MacDiarmid, A. G. Synth. Met. 1991, 41, 601.
24. Mandler, D.; Unwin, P. R. J. Phys. Chem. B 2003, 107, 408.